Title:
LASER APPARATUS AND EXTREME-ULTRAVIOLET LIGHT GENERATION SYSTEM USING THE SAME
Document Type and Number:
WIPO Patent Application WO/2013/144692
Kind Code:
A3
Abstract:
A MOPA laser apparatus 3 including a master oscillator 110 configured to output a pulsed laser beam, at least one amplifier 130i provided on the path of the pulsed laser beam output from the master oscillator, and at least one first optical beam shutter 120i (also called here isolator) provided on the path of the pulsed laser beam, said first optical beam shutter (also called here isolator) including two polarisation splitters and a Pockels cell located in- between including an electro-optical crystal being one of a GaAs crystal and a CdTe crystal.
Inventors:
NOWAK KRZYSZTOF (JP)
WAKABAYASHI OSAMU (JP)
WAKABAYASHI OSAMU (JP)
Application Number:
PCT/IB2013/000184
Publication Date:
February 20, 2014
Filing Date:
February 13, 2013
Export Citation:
Assignee:
GIGAPHOTON INC (JP)
NOWAK KRZYSZTOF (JP)
WAKABAYASHI OSAMU (JP)
NOWAK KRZYSZTOF (JP)
WAKABAYASHI OSAMU (JP)
International Classes:
H01S3/00; H01S3/23; H01S3/10; H01S3/223
Domestic Patent References:
| WO2011118830A1 | 2011-09-29 | |||
| WO2011124829A1 | 2011-10-13 | |||
| WO2002082600A2 | 2002-10-17 | |||
| WO2010103346A1 | 2010-09-16 |
Foreign References:
| JP2009026854A | 2009-02-05 | |||
| JP2008270549A | 2008-11-06 | |||
| JP2006128157A | 2006-05-18 | |||
| US20100142046A1 | 2010-06-10 | |||
| US20060187521A1 | 2006-08-24 |
Download PDF: