Title:
LASER BEAM PATTERN GENERATOR WITH COMPENSATION OF ROTATIONAL SCAN ERRORS
Document Type and Number:
WIPO Patent Application WO2003044602
Kind Code:
A3
Abstract:
A laser beam pattern generator has a substrate support capable of supporting a substrate, the substrate support having a support motor capable of moving the substrate support. A laser beam source is provided that is capable of generating a laser beam. A beam modulator is also provided that is capable of modulating the intensity of the laser beam according to a pattern. A rotating scanner is provided that has a plurality of mirror facets capable of rotating at a spinning frequency to scan the laser beam across the substrate. The laser beam pattern generator also has a rotating scanner compensator to deflect the laser beam according to a rotating scanner correction signal containing a harmonic of the spinning frequency to compensate for errors in the scanning of the laser beam arising from the rotating scanner. A controller is provided that is adapted to control the substrate support, laser beam source, beam modulator, rotating scanner, and rotating scanner compensator to modulate and scan the laser beam across the substrate to generate the pattern on the substrate.
Inventors:
AGORIO ENRIQUE RODRIGO
Application Number:
PCT/US2002/036833
Publication Date:
January 29, 2004
Filing Date:
November 15, 2002
Export Citation:
Assignee:
APPLIED MATERIALS INC (US)
International Classes:
G03F7/20; H01L21/027; (IPC1-7): G03F7/20; H04N1/047
Foreign References:
| US5999302A | 1999-12-07 | |||
| US5046796A | 1991-09-10 | |||
| US4002830A | 1977-01-11 |
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