Title:
LASER CHAMBER
Document Type and Number:
WIPO Patent Application WO/2015/125286
Kind Code:
A1
Abstract:
The present invention is capable of carrying out stable electrical discharge. A laser chamber is for a discharge excitation-type gas laser device and may be provided with the following: a first discharge electrode disposed inside the laser chamber; a second discharge electrode disposed inside the laser chamber so as to face the first discharge electrode; a fan for causing laser gas to flow between the first discharge electrode and the second discharge electrode; a first insulation member disposed on the upstream side and the downstream side of the laser gas flow at the first discharge electrode; a metal damper member disposed on the upstream side of the laser gas flow at the second discharge electrode; and a second insulation member disposed on the downstream side of the laser gas flow at the second discharge electrode.
Inventors:
IKEDA HIROYUKI (JP)
KAKIZAKI KOUJI (JP)
TSUSHIMA HIROAKI (JP)
KAKIZAKI KOUJI (JP)
TSUSHIMA HIROAKI (JP)
Application Number:
PCT/JP2014/054230
Publication Date:
August 27, 2015
Filing Date:
February 21, 2014
Export Citation:
Assignee:
GIGAPHOTON INC (JP)
International Classes:
H01S3/03
Foreign References:
JP2003060270A | 2003-02-28 | |||
JP2006229137A | 2006-08-31 | |||
JP2013141030A | 2013-07-18 |
Attorney, Agent or Firm:
EBISU International Patent Office (JP)
Patent business corporation エビス international patent firm (JP)
Patent business corporation エビス international patent firm (JP)
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