Title:
LASER IRRADIATION DEVICE, LASER IRRADIATION METHOD, AND PROJECTION MASK
Document Type and Number:
WIPO Patent Application WO/2019/107108
Kind Code:
A1
Abstract:
Provided are a laser irradiation device, a laser irradiation method, and a projection mask that are capable of suppressing variation in characteristics of multiple thin-film transistors included in a substrate. A laser irradiation device according to an embodiment of the present invention is characterized by being provided with: a light source that generates a laser beam; a projection lens that irradiates a prescribed region of a substrate which moves in a prescribed direction with the laser beam; and a projection mask which is provided on the projection lens and in which multiple openings are arrayed in a row at least in a prescribed direction, wherein the projection lens irradiates, multiple times, the prescribed region with the laser beam through the openings, and the transmittance, which is the proportion of transmission of the laser beam, is set to a prescribed value or lower for the openings that are among the multiple openings and that are arrayed after a prescribed number of openings from a first opening through which the laser beam is first applied to the prescribed region.
Inventors:
MIZUMURA MICHINOBU (JP)
Application Number:
PCT/JP2018/041562
Publication Date:
June 06, 2019
Filing Date:
November 08, 2018
Export Citation:
Assignee:
V TECH CO LTD (JP)
International Classes:
H01L21/268; H01L21/20; H01L21/336; H01L29/786
Domestic Patent References:
| WO2016186043A1 | 2016-11-24 |
Foreign References:
| JP2006013050A | 2006-01-12 | |||
| JP2007207896A | 2007-08-16 |
Attorney, Agent or Firm:
SHIRASAKA & PATENT PARTNERS (JP)
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