Title:
LASER IRRADIATION DEVICE, THIN-FILM TRANSISTOR MANUFACTURING METHOD, PROGRAM, AND PROJECTION MASK
Document Type and Number:
WIPO Patent Application WO/2018/155455
Kind Code:
A1
Abstract:
A laser irradiation device according to an embodiment of the present invention is provided with: a light source for generating laser light; a projection lens for irradiating a predetermined area of an amorphous silicon thin-film attached to a thin-film transistor with the laser light; and a projection mask pattern which is disposed on the projection lens and which transmits the laser light through a predetermined projection pattern. The laser irradiation device is characterized in that the projection mask pattern includes, in addition to a transmission area corresponding to the predetermined area, an auxiliary pattern which is disposed around the transmission area and which transmits the laser light.
Inventors:
MIZUMURA MICHINOBU (JP)
Application Number:
PCT/JP2018/006071
Publication Date:
August 30, 2018
Filing Date:
February 20, 2018
Export Citation:
Assignee:
V TECH CO LTD (JP)
International Classes:
H01L21/20; H01L21/027; H01L21/268
Domestic Patent References:
| WO2011055618A1 | 2011-05-12 | |||
| WO2012144403A1 | 2012-10-26 |
Foreign References:
| JP2004349269A | 2004-12-09 | |||
| JP2006245520A | 2006-09-14 | |||
| JP2006287129A | 2006-10-19 | |||
| JP2006210789A | 2006-08-10 |
Attorney, Agent or Firm:
SHIRASAKA & PATENT PARTNERS (JP)
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