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Title:
LASER DESORPTION/IONIZATION METHOD, MASS SPECTROMETRY METHOD, SAMPLE SUPPORT BODY, AND MANUFACTURING METHOD OF SAMPLE SUPPORT BODY
Document Type and Number:
WIPO Patent Application WO/2019/106961
Kind Code:
A1
Abstract:
This laser desorption/ionization method involves: a first step in which a sample support body (1) is prepared that comprises a substrate (2) in which multiple through-holes (2c) are formed that open in a first surface (2a) and a second surface (2b) opposite of each other, a conductive layer which is provided on at least the first surface, and a solvent (81) which is provided in the multiple through-holes and which has low volatility in a vacuum; a second step in which the sample (S) is placed on a placement surface (6a) of a placement unit (6), and the sample support body (1) is arranged on the sample (S) such that the second surface (2b) contacts the sample; and a third step in which, in a state in which the sample (S) is arranged between the placement unit (6) and the sample support body (1), by irradiating the first surface (2a) with laser light while applying a voltage to the conductive layer, a component of the sample (S), which mixes with the solvent and moves from the second surface (2b) through the through-holes (2c) towards the first surface (2a), becomes ionized.

Inventors:
NAITO Yasuhide (1955-1 Kurematsu-cho, Nishi-ku, Hamamatsu-sh, Shizuoka 02, 〒4311202, JP)
OHMURA Takayuki (1126-1 Ichino-cho, Higashi-ku, Hamamatsu-sh, Shizuoka 58, 〒4358558, JP)
KOTANI Masahiro (1126-1 Ichino-cho, Higashi-ku, Hamamatsu-sh, Shizuoka 58, 〒4358558, JP)
Application Number:
JP2018/037453
Publication Date:
June 06, 2019
Filing Date:
October 05, 2018
Export Citation:
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Assignee:
HAMAMATSU PHOTONICS K.K. (1126-1, Ichino-cho Higashi-ku, Hamamatsu-sh, Shizuoka 58, 〒4358558, JP)
International Classes:
G01N27/62; G01N27/64; H01J49/04; H01J49/16
Domestic Patent References:
WO2017038709A12017-03-09
Foreign References:
JP2003510776A2003-03-18
JP2009080106A2009-04-16
JP2013520655A2013-06-06
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (SOEI PATENT AND LAW FIRM, Marunouchi MY PLAZA 9th fl. 1-1, Marunouchi 2-chome, Chiyoda-k, Tokyo 05, 〒1000005, JP)
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