Title:
LASER PROCESSING METHOD
Document Type and Number:
WIPO Patent Application WO/2008/041539
Kind Code:
A1
Abstract:
A modified region is precisely formed at a desired position on the laser irradiation
surface of a processing object. Upon trace recording, when an average difference
(γ) has a value exceeding a predetermined threshold value, a particle
zone (Z) is determined, including a line zone (S) where the average difference
(γ) exceeds the predetermined threshold value. Thus it is determined
that particles are present on a line (5) along which cutting is to be carried out
and that measuring laser light is reflected diffusely by the particles. In the
line zone along which cutting is to carried out, a zone is then detected as the particle
zone(Z), in which a control signal is affected by the presence of the particles.
The control signal is then corrected in the particle zone (Z), thereby preventing
a collective lens from moving more than required because the control signal includes
an error due to the effect of the presence of the particles and making the focal
point of processing laser light precisely trace the surface (3).
More Like This:
Inventors:
ATSUMI KAZUHIRO (JP)
KUNO KOJI (JP)
SUZUKI TATSUYA (JP)
KUNO KOJI (JP)
SUZUKI TATSUYA (JP)
Application Number:
PCT/JP2007/068515
Publication Date:
April 10, 2008
Filing Date:
September 25, 2007
Export Citation:
Assignee:
HAMAMATSU PHOTONICS KK (JP)
ATSUMI KAZUHIRO (JP)
KUNO KOJI (JP)
SUZUKI TATSUYA (JP)
ATSUMI KAZUHIRO (JP)
KUNO KOJI (JP)
SUZUKI TATSUYA (JP)
International Classes:
B23K26/00; B23K26/38; B23K26/40; H01L21/301
Foreign References:
| JP2006187782A | 2006-07-20 | |||
| JPH11506837A | 1999-06-15 | |||
| JP2004343008A | 2004-12-02 | |||
| JP2004343008A | 2004-12-02 |
Other References:
See also references of EP 2070635A4
"Internal Marking of Glass Substrate with Solid-state Laser", PROCEEDINGS OF THE 45TH LASER MATERIALS PROCESSING CONFERENCE, December 1998 (1998-12-01), pages 23 - 28
"Ultrashort Pulse Laser Microprocessing of Silicon", PREPRINTS OF THE NATIONAL MEETINGS OF JAPAN WELDING SOCIETY, vol. 66, April 2000 (2000-04-01), pages 72 - 73
"Forming of Photoinduced Structure within Glass by Femtosecond Laser Irradiation", PROCEEDINGS OF THE 42ND LASER MATERIALS PROCESSING CONFERENCE, November 1997 (1997-11-01), pages 105 - 111
"Internal Marking of Glass Substrate with Solid-state Laser", PROCEEDINGS OF THE 45TH LASER MATERIALS PROCESSING CONFERENCE, December 1998 (1998-12-01), pages 23 - 28
"Ultrashort Pulse Laser Microprocessing of Silicon", PREPRINTS OF THE NATIONAL MEETINGS OF JAPAN WELDING SOCIETY, vol. 66, April 2000 (2000-04-01), pages 72 - 73
"Forming of Photoinduced Structure within Glass by Femtosecond Laser Irradiation", PROCEEDINGS OF THE 42ND LASER MATERIALS PROCESSING CONFERENCE, November 1997 (1997-11-01), pages 105 - 111
Attorney, Agent or Firm:
HASEGAWA, Yoshiki et al. (Ginza First Bldg.10-6, Ginza 1-chom, Chuo-ku Tokyo 61, JP)
Download PDF: