Title:
LASER SYSTEM AND EUV LIGHT GENERATION SYSTEM
Document Type and Number:
WIPO Patent Application WO/2018/179094
Kind Code:
A1
Abstract:
The laser system according to the present disclosure is provided with: a laser device that outputs laser light; a transmission optical system that is disposed in a path between the laser device and a target supplied to the inside of an EUV chamber in which EUV light is to be generated; a reflection optical system, which is disposed in a path between the transmission optical system and the target, and which reflects toward the target the laser light transmitted from the transmission optical system; a first sensor, which is provided in a path between the transmission optical system and the reflection optical system, and which detects laser light travelling toward the reflection optical system from the laser device; a second sensor, which is provided in a path extending from the reflection optical system to the inside of the laser device, and which detects return light of the laser light, said return light travelling backward to the laser device by being reflected by the reflection optical system; and a control unit that determines that the reflection optical system is damaged in the cases where a laser light abnormality is not detected by the first sensor, and the quantity of the return light detected by the second sensor exceeds a predetermined light quantity value.
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Inventors:
UENO YOSHIFUMI (JP)
TAKASHIMA YUTA (JP)
TAKASHIMA YUTA (JP)
Application Number:
PCT/JP2017/012676
Publication Date:
October 04, 2018
Filing Date:
March 28, 2017
Export Citation:
Assignee:
GIGAPHOTON INC (JP)
International Classes:
G03F7/20
Domestic Patent References:
| WO2016142995A1 | 2016-09-15 |
Foreign References:
| JP2012147022A | 2012-08-02 | |||
| JP2014041828A | 2014-03-06 | |||
| JP2013218286A | 2013-10-24 | |||
| JP2006134974A | 2006-05-25 | |||
| JP2008103545A | 2008-05-01 |
Attorney, Agent or Firm:
TSUBASA PATENT PROFESSIONAL CORPORATION (JP)
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