LASER SYSTEM, EXTREME-ULTRAVIOLET LIGHT GENERATION DEVICE, AND METHOD FOR GENERATING EXTREME-ULTRAVIOLET LIGHT

WIPO Patent Application WO/2019/008719

A1

A laser system comprises: a pulse laser system that emits first laser light having a first wavelength component and a first polarized component and second laser light having the first wavelength component and a second polarized component; a guide laser device that emits third laser light having a second wavelength component; a polarization conversion mechanism configured to switch between a first state of turning the third laser light into first guide laser light having the first polarized component and a second state of turning the third laser light into second guide laser light having the second polarized component; a dichroic mirror that reflects either one of the first and second laser light or the first and second guide laser light and transmits the other one; and a polarization beam splitter that reflects the first laser light and the first guide laser light and transmits the second laser light and the second guide laser light.

JP6496804	Pattern forming method, actinic or radiation-sensitive resin composition, actinic cheilitis or radiation-sensitive film, and method for producing an electronic device.
JPH07153658	PROJECTION EXPOSURE METHOD AND PROJECTION ALIGNER USED FOR IT
WO/2024/024703	RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND SALT

ANDO MASAHIKO (JP)

PCT/JP2017/024760

January 10, 2019

July 06, 2017

Click for automatic bibliography generation  

GIGAPHOTON INC (JP)

G03F7/20; H01S3/00; H05G2/00

JP2016538703A	2016-12-08
JP2013105725A	2013-05-30
JP2013513929A	2013-04-22
JP2010135769A	2010-06-17
JP2008146082A	2008-06-26

HOSAKA Nobuhisa (JP)

View/Download PDF      PDF Help

Previous Patent: OPTICAL PATH CONTROL DEVICE AND OPTICAL PATH CONTROL METHOD

Next Patent: PRODUCT FOR PREPARING NUKAZUKE, NUKAZUKE SET AND METHOD FOR MANUFACTURING PRODUCT FOR PREPARING NUKA...