Title:
LAYERED FILM FOR PATTERN FORMATION, NON-PHOTOSENSITIVE SCREEN PRINTING PLATE, AND METHOD FOR MANUFACTURING SAME
Document Type and Number:
WIPO Patent Application WO/2022/215283
Kind Code:
A1
Abstract:
[Problem] To provide a layered film for pattern formation which does not absorb moisture in the air or leave unnecessary components on the surface of a plate film, and in which the tackiness of a photosensitive resin layer is suppressed. [Solution] Provided are: a layered film for pattern formation characterized by comprising a support layer, an adhesive layer, a water-insoluble polymer layer, and a photosensitive resin layer in the given order; a non-photosensitive screen printing plate in which the layered film for pattern formation is employed; and a method for manufacturing same.
Inventors:
ADACHI DAISAKU (JP)
OHMI MAMORU (JP)
IWATA SHUJI (JP)
OHUE ATSUSHI (JP)
MIYASHITA NAOKI (JP)
OHMI MAMORU (JP)
IWATA SHUJI (JP)
OHUE ATSUSHI (JP)
MIYASHITA NAOKI (JP)
Application Number:
PCT/JP2021/029866
Publication Date:
October 13, 2022
Filing Date:
August 16, 2021
Export Citation:
Assignee:
MURAKAMI CO LTD (JP)
International Classes:
B41C1/14; B41N1/24; G03F7/004; G03F7/11; G03F7/12
Domestic Patent References:
| WO2006093040A1 | 2006-09-08 | |||
| WO2004013700A1 | 2004-02-12 |
Foreign References:
| JP2003346648A | 2003-12-05 | |||
| JP2004086089A | 2004-03-18 | |||
| JP2019191518A | 2019-10-31 |
Attorney, Agent or Firm:
NAKAMURA Yukitaka et al. (JP)
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