Title:
LIFT TYPE SUBSTRATE TREATMENT DEVICE, AND SUBSTRATE TREATMENT SYSTEM WITH THE SUBSTRATE TREATMENT DEVICE
Document Type and Number:
WIPO Patent Application WO/2002/069392
Kind Code:
A1
Abstract:
A lift type substrate treatment device having a function to transfer a substrate from one to the other side of a treatment line and capable of treating the substrate during transfer, and a substrate treatment system having the lift type substrate treatment device; the lift type substrate treatment device, comprising a cabinet-like cover body (11) having a substrate inlet (11a) and a substrate outlet (11b) provided therein parallel with each other in vertical direction, a transfer supporting means forming a treatment mechanism (20) installed in the cover body (11), supportedly accepting the substrate carried in from the substrate inlet (11a), and discharging the substrate from the substrate outlet (11b), a support frame (21) for supporting the transfer/supporting means, the treatment mechanism (20) disposed above the transfer/supporting means and having a treatment fluid discharge means for discharging the treatment fluid onto the substrate, and a lifting mechanism (40) for supportedly lifting the treatment mechanism (20) in vertical direction to move the treatment mechanism (20) to the substrate inlet (11a) and the substrate outlet (11b).
Inventors:
MIZUKAWA SHIGERU
NAKATA KATSUTOSHI
MATSUMOTO SHUNJI
NAKATA KATSUTOSHI
MATSUMOTO SHUNJI
Application Number:
PCT/JP2002/001583
Publication Date:
September 06, 2002
Filing Date:
February 21, 2002
Export Citation:
Assignee:
SUMITOMO PRECISION PROD CO (JP)
International Classes:
B65G49/06; H01L21/027; H01L21/304; H01L21/306; H01L21/677; (IPC1-7): H01L21/68; B65G49/06; B65G49/07; H01L21/027; H01L21/306
Foreign References:
| JP2000031239A | 2000-01-28 | |||
| JP2000183019A | 2000-06-30 | |||
| JPH01137453U | 1989-09-20 |
Attorney, Agent or Firm:
Murakami, Satoshi (Rise 88 Bldg. 1-10 Honjo-Higashi 1-chom, Kita-ku Osaka-shi Osaka, JP)
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