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Title:
LIGHT-ABSORBING POLYMERS AND APPLICATION THEREOF TO ANTIREFLECTION FILM
Document Type and Number:
WIPO Patent Application WO/1999/047571
Kind Code:
A1
Abstract:
A high-performance antireflection film which highly absorbs a given light, e.g., far ultraviolet, tenaciously adheres to substrates upon film formation, is satisfactory in covering, and eliminates the influence of standing waves in the production of integrated circuits; novel light-absorbing polymers for forming the antireflection film; and a process for producing the polymers. One of the polymers is produced by esterifying a copolymer comprising carboxylic anhydride groups and/or dicarboxylic acid groups such as maleic acid as basic repeating units with a hydroxylated aromatic chromophore. The unreacted carboxylic acid groups or acid anhydride groups remaining in the esterified light-absorbing polymer may be amidated and/or imidized with an aminated aromatic compound. These polymers each is dissolved in an organic solvent comprising an alcohol, aromatic hydrocarbon, ketone, ester, or combination of these, and the solution is applied to a substrate and then baked to form an antireflection film.

Inventors:
KANG WEN-BING (JP)
NISHIWAKI YOSHINORI (JP)
KIMURA KEN (JP)
MATSUO SHOKO (JP)
TANAKA HATSUYUKI (JP)
Application Number:
PCT/JP1999/001244
Publication Date:
September 23, 1999
Filing Date:
March 15, 1999
Export Citation:
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Assignee:
CLARIANT JAPAN K K (JP)
KANG WEN BING (JP)
NISHIWAKI YOSHINORI (JP)
KIMURA KEN (JP)
MATSUO SHOKO (JP)
TANAKA HATSUYUKI (JP)
International Classes:
H01L21/027; C08F8/14; C08F8/30; C08F8/32; C08F222/02; C08F222/04; C09D5/32; G03F7/09; G03F7/11; (IPC1-7): C08F8/14; C08F220/20; C08F220/54; C09D5/00; G03F7/11
Foreign References:
JPH10199789A1998-07-31
JPH0675378A1994-03-18
JPH07268036A1995-10-17
JPH07316268A1995-12-05
Other References:
See also references of EP 0982320A4
Attorney, Agent or Firm:
Kanao, Hiroki (10-14 Kandaawajicho 2-chome Chiyoda-ku, Tokyo, JP)
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