Title:
LIGHT EMITTING DEVICE, AND ELECTRONIC APPARATUS
Document Type and Number:
WIPO Patent Application WO/2021/024652
Kind Code:
A1
Abstract:
A light emitting device includes a first substrate, a light source on a first surface of the first substrate and that emits light toward an object, and a driver disposed in the first substrate and that drives the light source. The driver overlaps the light source in a plan view. The light emitting device includes at least one first via disposed in the first substrate and overlapping the driver in the plan view, and a first conductor on a second surface of the first substrate opposite the first surface and overlapping the light source, the driver, and the at least one first via in the plan view. The first conductor is connected to the at least one first via.
Inventors:
SAKAI KIYOHISA (JP)
YASUKAWA HIROHISA (JP)
NAGAO MASAYUKI (JP)
YASUKAWA HIROHISA (JP)
NAGAO MASAYUKI (JP)
Application Number:
PCT/JP2020/025772
Publication Date:
February 11, 2021
Filing Date:
July 01, 2020
Export Citation:
Assignee:
SONY SEMICONDUCTOR SOLUTIONS CORP (JP)
International Classes:
H01S5/022; G01S7/00; H01L23/00; H01S5/024; H01S5/042; H01S5/062; H01S5/0683; H01S5/40
Domestic Patent References:
| WO2019202874A1 | 2019-10-24 |
Foreign References:
| US20020028045A1 | 2002-03-07 | |||
| US20110249980A1 | 2011-10-13 | |||
| US20130163627A1 | 2013-06-27 | |||
| JP2009170675A | 2009-07-30 |
Attorney, Agent or Firm:
MARUSHIMA, Toshikazu (JP)
Download PDF:
Previous Patent: TIRE VULCANIZATION DEVICE AND METHOD
Next Patent: GAS PROCESSING DEVICE, GAS PROCESSING SYSTEM, AND GAS PROCESSING METHOD
Next Patent: GAS PROCESSING DEVICE, GAS PROCESSING SYSTEM, AND GAS PROCESSING METHOD