Title:
LIGHT-EMITTING ELEMENT AND ENERGETIC PARTICLE RADIATION METHOD AND POLISHING METHOD FOR LIGHT-EMITTING ELEMENT
Document Type and Number:
WIPO Patent Application WO/2019/233174
Kind Code:
A1
Abstract:
A polishing method for a light-emitting element. An energetic particle is used to subject a light-emitting element to radiation with an increasing energy gradient, such that damage is homogeneously inflicted on a phase A of the light-emitting element at a predetermined depth range below a surface of the light-emitting element until the Mohs hardness of the phase A is approximately the same as the Mohs hardness of a phase Y. The radiated light-emitting element is then polished to the predetermined depth so as to smooth out the surface thereof.
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Inventors:
ZHANG HONGXIU (CN)
HU FEI (CN)
LI YI (CN)
HU FEI (CN)
LI YI (CN)
Application Number:
PCT/CN2019/081652
Publication Date:
December 12, 2019
Filing Date:
April 08, 2019
Export Citation:
Assignee:
APPOTRONICS CORP LTD (CN)
International Classes:
B24B1/00; B24B29/02; B24B37/04; C03C23/00; C23C14/48
Foreign References:
| CN107540369A | 2018-01-05 | |||
| CN107540369A | 2018-01-05 | |||
| US5154023A | 1992-10-13 | |||
| CN1925128A | 2007-03-07 |
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