Title:
LIGHT-EXPOSURE SYSTEM
Document Type and Number:
WIPO Patent Application WO/2012/044077
Kind Code:
A2
Abstract:
The present invention relates to a light-exposure system, and more specifically relates to a light-exposure system comprising: a light-emitting unit; a film-conveying unit wherein a film makes close contact with the surface thereof and is conveyed while being bent into a circle, an ellipse or the curvature of part thereof; and a pattern-forming unit for forming a polarisation pattern on the film by transmitting, onto the closely contacting film, the light emanating from the light-emitting unit. As a result, the light-exposure system is able to minimise film jittering and weaving even when formation of the polarisation pattern is carried out while the film, which is wound on a roller, is continuously played out, and allows uniform light exposure over a relatively wide region such that the invention is able to contribute to improved quality, notably in the patterned retarder, and increased production efficiency.
Inventors:
CHOI BONG JIN (KR)
KIM YONG HWAN (KR)
KIM YONG HWAN (KR)
Application Number:
PCT/KR2011/007166
Publication Date:
April 05, 2012
Filing Date:
September 28, 2011
Export Citation:
Assignee:
DONGWOO FINE CHEM CO LTD (KR)
CHOI BONG JIN (KR)
KIM YONG HWAN (KR)
CHOI BONG JIN (KR)
KIM YONG HWAN (KR)
International Classes:
G03F7/20; G02F1/00; G03F9/00
Foreign References:
| JP4503212B2 | 2010-07-14 | |||
| KR100791364B1 | 2008-01-07 | |||
| JP2007072171A | 2007-03-22 | |||
| KR20040070038A | 2004-08-06 |
Attorney, Agent or Firm:
LEE, Joon Ho et al. (KR)
이준호 (KR)
이준호 (KR)
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Claims: