LIGHT-SENSITIVE POLYMER COMPOSITION, METHOD FOR PRODUCING PATTERN, AND ELECTRONIC COMPONENT - HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD.

Title:

LIGHT-SENSITIVE POLYMER COMPOSITION, METHOD FOR PRODUCING PATTERN, AND ELECTRONIC COMPONENT

Document Type and Number:

WIPO Patent Application WO/2011/089894

Kind Code:

A1

Abstract:

Disclosed is a light-sensitive polymer composition comprising (a) a polymer soluble in an aqueous alkaline solution, (b) a compound the generates acid by means of light, (c1) an aluminum chelate complex having three bidentate ligands of the same type, and (c2) an aluminum chelate complex having three bidentate ligands of two or three types.

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Inventors:

ONO, Keishi (13-1, Higashi-cho 4-chome, Hitachi-sh, Ibaraki 55, 〒3178555, JP)
小野　敬司 (〒55 茨城県日立市東町四丁目１３番１号　日立化成工業株式会社内 Ibaraki, 〒3178555, JP)
MINEGISHI, Tomonori (13-1, Higashi-cho 4-chome, Hitachi-sh, Ibaraki 55, 〒3178555, JP)
峯岸　知典 (〒55 茨城県日立市東町四丁目１３番１号　日立化成工業株式会社内 Ibaraki, 〒3178555, JP)
OOE, Masayuki (13-1, Higashi-cho 4-chome, Hitachi-sh, Ibaraki 55, 〒3178555, JP)

Application Number:

JP2011/000250

Publication Date:

July 28, 2011

Filing Date:

January 19, 2011

Export Citation:

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Assignee:

HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD. (4-25, Koraku 1-chome Bunkyo-k, Tokyo 04, 〒1120004, JP)
日立化成デュポンマイクロシステムズ株式会社 (〒04 東京都文京区後楽一丁目４番２５号 Tokyo, 〒1120004, JP)
ONO, Keishi (13-1, Higashi-cho 4-chome, Hitachi-sh, Ibaraki 55, 〒3178555, JP)
小野　敬司 (〒55 茨城県日立市東町四丁目１３番１号　日立化成工業株式会社内 Ibaraki, 〒3178555, JP)
MINEGISHI, Tomonori (13-1, Higashi-cho 4-chome, Hitachi-sh, Ibaraki 55, 〒3178555, JP)
峯岸　知典 (〒55 茨城県日立市東町四丁目１３番１号　日立化成工業株式会社内 Ibaraki, 〒3178555, JP)

International Classes:

G03F7/085; C08G69/02; C08K5/13; C08K5/1515; C08K5/1525; C08K5/17; C08K5/3445; C08K5/41; C08K5/5419; C08K5/56; C08L77/00; G03F7/004; G03F7/023; G03F7/40; H01L21/027

Attorney, Agent or Firm:

WATANABE, Kihei et al. (Shibashin Kanda Bldg. 3rd Floor, 26 Kanda Suda-cho 1-chome, Chiyoda-k, Tokyo 41, 〒1010041, JP)

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