Title:
LIGHT-SOURCE APPARATUS AND PROJECTION SYSTEM
Document Type and Number:
WIPO Patent Application WO/2019/010909
Kind Code:
A1
Abstract:
A light-source apparatus (100) and a projection system, the light-source apparatus (100) comprising a light source (110) and a wavelength conversion element (130); the wavelength conversion element (130) comprises a pixel unit array, the pixel unit array comprising pixel units (132) that correspond one-to-one to image pixels; the light source (110) emits one or more excitation light beams (L4) that illuminate the pixel units (132), wherein one excitation light beam (L4) only illuminates one pixel unit (132) at a time; the pixel units (132) are provided with a wavelength conversion material, the wavelength conversion material absorbing excitation light (L4) that illuminates the same and generating excited light (L5). The light-source apparatus (100) reduces the loss of excitation light (L4), and increases the utilization rate of the excitation light (L4) and the wavelength conversion material.
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Inventors:
HU FEI (CN)
GUO ZUQIANG (CN)
XU MENGMENG (CN)
LI YI (CN)
GUO ZUQIANG (CN)
XU MENGMENG (CN)
LI YI (CN)
Application Number:
PCT/CN2017/114712
Publication Date:
January 17, 2019
Filing Date:
December 06, 2017
Export Citation:
Assignee:
APPOTRONICS CORP LTD (CN)
International Classes:
G03B21/20
Foreign References:
| CN106444242A | 2017-02-22 | |||
| CN102193301A | 2011-09-21 | |||
| CN206946179U | 2018-01-30 | |||
| CN105044975A | 2015-11-11 | |||
| CN105549311A | 2016-05-04 | |||
| US6212213B1 | 2001-04-03 |
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