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Patent Searching and Data


Title:
LIGHTING DEVICE FOR EXPOSURE, EXPOSURE APPARATUS AND EXPOSURE METHOD
Document Type and Number:
WIPO Patent Application WO/2019/059315
Kind Code:
A1
Abstract:
An integrator unit (90) is provided with two fly-eye lenses (91, 92), and a fly-eye lens distance adjustment mechanism (95) changes a distance (d) in an optical axis direction between the two fly-eye lenses (91, 92). The distance (d) in the optical axis direction between the two fly-eye lenses (91, 92) is changed in response to a shape change in a reflection surface of a plane mirror (68) by a mirror bending mechanism (70), thereby correcting a change in average illuminance value on an exposure surface due to mirror bending. The present invention provides a lighting device for exposure, an exposure apparatus and an exposure method which make it possible to suppress variations in takt time by correcting a change in average illuminance value on an exposure surface due to mirror bending.

Inventors:
ENOMOTO Yoshiyuki (134, Godo-cho, Hodogaya-ku, Yokohama-sh, Kanagawa 05, 〒2400005, JP)
KAWASHIMA Hironori (134, Godo-cho, Hodogaya-ku, Yokohama-sh, Kanagawa 05, 〒2400005, JP)
Application Number:
JP2018/034920
Publication Date:
March 28, 2019
Filing Date:
September 20, 2018
Export Citation:
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Assignee:
V TECHNOLOGY CO., LTD. (134 Godo-cho, Hodogaya-ku Yokohama-sh, Kanagawa 05, 〒2400005, JP)
International Classes:
G03F7/20; G02B3/00; G02B19/00; G03F7/22
Domestic Patent References:
WO2016190381A12016-12-01
Foreign References:
JPH0613289A1994-01-21
JP2010153663A2010-07-08
Attorney, Agent or Firm:
EIKOH PATENT FIRM, P.C. (Toranomon East Bldg. 10F, 7-13 Nishi-Shimbashi 1-chome, Minato-k, Tokyo 03, 〒1050003, JP)
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