LIGHTING OPTICAL SYSTEM, EXPOSURE SYSTEM, AND EXPOSURE METHOD

Title:

LIGHTING OPTICAL SYSTEM, EXPOSURE SYSTEM, AND EXPOSURE METHOD

Document Type and Number:

WIPO Patent Application WO/2007/055120

Kind Code:

A1

Abstract:

A lighting optical system which illuminates a surface to be illuminated with light in a desired polarizing state by regulating a polarization distribution on an illumination pupil surface or a surface to be illuminated. A lighting optical system which illuminates surfaces to be illuminated (M; W) based on light from a light source (1). A polarization distribution regulating member (14) for regulating a light polarization distribution on an illumination pupil surface is provided. The polarization distribution regulating member is disposed so as to be rotatable around the optical axis (AX) of a lighting optical system, and has an optical rotation member (9) for imparting to an incident light an optical rotation varying according to an incident position. The optical rotation member is formed of an optically rotating optical material, and has its optical-axis-direction thickness changed along a direction perpendicular to the optical axis.

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Inventors:

TANAKA HIROHISA (JP)

Application Number:

PCT/JP2006/321607

Publication Date:

May 18, 2007

Filing Date:

October 30, 2006

Export Citation:

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Assignee:

NIKON CORP (JP)
TANAKA HIROHISA (JP)

International Classes:

H01L21/027; G02B19/00; G03F7/20

Domestic Patent References:

WO2005050718A1	2005-06-02
WO2004051717A1	2004-06-17

Foreign References:

JP2005302826A	2005-10-27
JP2005108925A	2005-04-21
JP2005005521A	2005-01-06

Other References: