Title:
LIMITING DEVICE, LIMITING STRUCTURE, ADJUSTING METHOD THEREFOR, AND VAPOR DEPOSITION SYSTEM
Document Type and Number:
WIPO Patent Application WO/2019/041904
Kind Code:
A1
Abstract:
A limiting device for vapor deposition, comprising a limiting structure; the limiting structure comprises a first adjusting structure (1) and a second adjusting structure (2) which are provided on the same plane, the first adjusting structure (1) being opposite to a side of the second adjusting structure (2), and the first adjusting structure (1) and the second adjusting structure (2) being spaced apart from each other to form a spacing region. The first adjusting structure (1) and the second adjusting structure (2) are configured to be able to move relative to each other so as to adjust the range of the spacing region. Further provided are an adjusting method for a limiting structure, an adjusting method for a limiting device, and a vapor deposition system.
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Inventors:
DUAN TINGYUAN (CN)
ZOU QINGHUA (CN)
YAO GU (CN)
ZOU QINGHUA (CN)
YAO GU (CN)
Application Number:
PCT/CN2018/088180
Publication Date:
March 07, 2019
Filing Date:
May 24, 2018
Export Citation:
Assignee:
BOE TECHNOLOGY GROUP CO LTD (CN)
HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO LTD (CN)
HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO LTD (CN)
International Classes:
C23C14/24; C23C14/54
Foreign References:
| CN207313687U | 2018-05-04 | |||
| CN107365962A | 2017-11-21 | |||
| CN1417374A | 2003-05-14 | |||
| CN102443759A | 2012-05-09 | |||
| CN102834541A | 2012-12-19 | |||
| CN103243302A | 2013-08-14 | |||
| JPS56146879A | 1981-11-14 |
Attorney, Agent or Firm:
TEE&HOWE INTELLECTUAL PROPERTY ATTORNEYS (CN)
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