Title:
LINEAR POLYIMIDE PRECURSOR, LINEAR POLYIMIDE, THERMALLY CURED PRODUCT OF THE LINEAR POLYIMIDE, AND METHOD FOR PRODUCING THE LINEAR POLYIMIDE
Document Type and Number:
WIPO Patent Application WO/2009/145339
Kind Code:
A1
Abstract:
Disclosed is a linear polyimide obtained from mellophanic acid dianhydride, a diamine (NH2-A-NH2) and a monofunctional acid anhydride and containing a repeating unit represented by general formula (3) (wherein A represents a divalent aromatic diamine residue or an aliphatic diamine residue, B represents a monofunctional acid anhydride residue, and n represents the polymerization degree). The polyimide has excellent solubility in organic solvents and thermoplasticity, while exhibiting high adhesion to copper foils or non-thermoplastic polyimide films, high glass transition temperature and high toughness.
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Inventors:
HASEGAWA MASATOSHI (JP)
KITAMURA NAOYUKI (JP)
KITAMURA NAOYUKI (JP)
Application Number:
PCT/JP2009/059938
Publication Date:
December 03, 2009
Filing Date:
May 26, 2009
Export Citation:
Assignee:
JFE CHEMICAL CORP (JP)
HASEGAWA MASATOSHI (JP)
KITAMURA NAOYUKI (JP)
HASEGAWA MASATOSHI (JP)
KITAMURA NAOYUKI (JP)
International Classes:
C08G73/10; B32B15/08; B32B15/088; C08F299/02; C09J179/08
Domestic Patent References:
WO2008013288A1 | 2008-01-31 | |||
WO2008140107A1 | 2008-11-20 | |||
WO2006030700A1 | 2006-03-23 |
Foreign References:
JPS4616906B1 | 1971-05-10 | |||
JP2002526618A | 2002-08-20 | |||
JP2005096251A | 2005-04-14 | |||
JP2007110118A | 2007-04-26 |
Other References:
FANG, X. ET AL.: "Polyimides Derived from Mellophanic Dianhydride", MACROMOLECULES, vol. 35, no. 23, 2002, pages 8708 - 8717, XP008120968
See also references of EP 2295489A4
MACROMOLECULES, vol. 32, 1999, pages 387
MACROMOLECULES, vol. 35, 2002, pages 8708
See also references of EP 2295489A4
MACROMOLECULES, vol. 32, 1999, pages 387
MACROMOLECULES, vol. 35, 2002, pages 8708
Attorney, Agent or Firm:
OCHIAI, Kenichiro (JFE TECHNO-RESEARCH CORPORATION 7th Floor Yanagiya Building,1-10,Nihonbashi 2-chome, Chuo-k, Tokyo 27, JP)
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