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Patent Searching and Data


Title:
LINER-BASED ASSEMBLY FOR REMOVING IMPURITIES
Document Type and Number:
WIPO Patent Application WO/2012/058384
Kind Code:
A3
Abstract:
The present disclosure relates to a liner for storing a material, the liner including at least two layers, wherein a layer that is in contact with the material is an active layer. The active layer may be made active by incorporating a scavenger into the layer. At least one layer of the liner may comprise a polymer or a fluoropolymer. In some embodiments, the active layer may be configured for removing microbridging components in photoresists. In some embodiments, the active layer may be made active by coating the interior of the layer with an inert material, such as glass. In further embodiments, the liner may be positioned within a stainless steel canister. The present disclosure also relates to a liner-based assembly including a liner for storing a material, an overpack within which the liner is positioned, and a purifying packet positioned between the liner and the overpack.

Inventors:
TOM GLENN (US)
DUBOIS LAWRENCE H (US)
Application Number:
PCT/US2011/058013
Publication Date:
August 16, 2012
Filing Date:
October 27, 2011
Export Citation:
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Assignee:
ADVANCED TECH MATERIALS (US)
TOM GLENN (US)
DUBOIS LAWRENCE H (US)
International Classes:
B65D25/14; B32B1/02; B65D81/24; B65D85/84
Foreign References:
US6817485B22004-11-16
US20090297769A12009-12-03
US6908652B12005-06-21
US20040086749A12004-05-06
Other References:
See also references of EP 2632815A4
Attorney, Agent or Firm:
WITZANY, Nathan, J. et al. (50 South Sixth Street Suite 150, Minneapolis MN, US)
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