Title:
LIQUID CHEMICAL, PRODUCTION METHOD FOR LIQUID CHEMICAL, AND METHOD FOR ANALYZING TEST LIQUID
Document Type and Number:
WIPO Patent Application WO/2019/139062
Kind Code:
A1
Abstract:
The present invention addresses the issue of providing a liquid chemical having excellent defect suppression performance even when used in a resist process using KrF excimer laser exposure and ArF excimer laser exposure. In addition, the present invention addresses the issue of providing a method for analyzing test liquids and a method for producing the liquid chemical. The liquid chemical contains an organic solvent and metal-containing particles that contain metal atoms and have a particle size of 10–100 nm. The number of metal-containing particles contained in the liquid chemical is 1.0 × 10–2–1.0 × 1012/cm3.
Inventors:
KAMIMURA TETSUYA (JP)
Application Number:
PCT/JP2019/000441
Publication Date:
July 18, 2019
Filing Date:
January 10, 2019
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/26
Domestic Patent References:
| WO2017170428A1 | 2017-10-05 | |||
| WO2018142888A1 | 2018-08-09 |
Foreign References:
| JP2016073922A | 2016-05-12 | |||
| JP2002099076A | 2002-04-05 | |||
| US20050016929A1 | 2005-01-27 | |||
| US20160336200A1 | 2016-11-17 |
Attorney, Agent or Firm:
ITOH Hideaki et al. (JP)
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