Title:
LIQUID CRYSTAL COMPOUNDS HAVING NEGATIVE PERMITTIVITY, LIQUID CRYSTAL COMPOSITIONS, AND LIQUID CRYSTAL DISPLAY DEVICE
Document Type and Number:
WIPO Patent Application WO/1998/014418
Kind Code:
A1
Abstract:
Liqud crystal compounds and liquid crystal compositions which are best suited as a liquid crystal material required to have negative permittivity including an IPS mode. The compounds are represented by general formulae (1) and (1-1), wherein R�1? and R�2? each independently represent an alkyl group having 1 to 10 carbon atoms; Z�1? to Z�4? each independently represent -(CH�2?)�2?- or the like; A�1? to A�4? each independently represent 1,4-cyclohexylene or the like; Q�1? and Q�2? each independently represent -CH�2?- or the like; X optionally represents a haloalkyl or -CH�2?-; and k, l, m, and n are each 0 or 1, provided that l + k + m + n $m(F) 3.
Inventors:
MATSUI SHUICHI (JP)
ANDO TSUGUMICHI (JP)
MIYAZAWA KAZUTOSHI (JP)
TAKEUCHI HIROYUKI (JP)
TAKESHITA FUSAYUKI (JP)
NAKAGAWA ETSUO (JP)
ANDO TSUGUMICHI (JP)
MIYAZAWA KAZUTOSHI (JP)
TAKEUCHI HIROYUKI (JP)
TAKESHITA FUSAYUKI (JP)
NAKAGAWA ETSUO (JP)
Application Number:
PCT/JP1997/003503
Publication Date:
April 09, 1998
Filing Date:
October 01, 1997
Export Citation:
Assignee:
CHISSO CORP (JP)
MATSUI SHUICHI (JP)
ANDO TSUGUMICHI (JP)
MIYAZAWA KAZUTOSHI (JP)
TAKEUCHI HIROYUKI (JP)
TAKESHITA FUSAYUKI (JP)
NAKAGAWA ETSUO (JP)
MATSUI SHUICHI (JP)
ANDO TSUGUMICHI (JP)
MIYAZAWA KAZUTOSHI (JP)
TAKEUCHI HIROYUKI (JP)
TAKESHITA FUSAYUKI (JP)
NAKAGAWA ETSUO (JP)
International Classes:
C07C17/16; C07C17/32; C07C22/00; C07C22/08; C07C25/18; C07C25/24; C07C43/192; C07C43/225; C07D309/04; C07D309/06; C07D319/06; C07D335/02; C07D339/08; C09K19/30; C09K19/34; C09K19/42; (IPC1-7): C07C22/08; C07C43/172; C07C43/192; C07C43/225; C07D239/26; C07D309/04; C07D309/06; C07D319/06; C07D335/02; C07D339/08; C09K19/30; C09K19/34; C09K19/42; G02F1/13
Foreign References:
| JPH05505828A | 1993-08-26 | |||
| JPH0656718A | 1994-03-01 |
Attorney, Agent or Firm:
Nonaka, Katsuhiko (Tsukiji 4-chome Chuoh-ku, Tokyo 104, JP)
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