Title:
LIQUID CRYSTAL DRIPPING APPARATUS AND METHOD WHEREIN JETTING MODE OF LIQUID CRYSTAL IS CHANGED
Document Type and Number:
WIPO Patent Application WO/2011/013421
Kind Code:
A1
Abstract:
Disclosed is a liquid crystal dripping apparatus (101) wherein a row composed of a plurality of jetting ports for dripping a liquid crystal onto a substrate is formed on the outer circumferential surface of a head (11). The liquid crystal dripping apparatus (101) is provided with: a jetting section, which jets the liquid crystal onto the substrate (8) from each jetting port, corresponding to a shift of the head (11) in the Y direction; and a plurality of shutters, which are provided corresponding to respective jetting ports on the outer circumferential surface of the head (11) and open/close the corresponding jetting ports, respectively. The row extends in the X direction, and the interval between the jetting ports in the row is equal to or smaller than the minimum dripping interval instructed by means of a liquid crystal dripping pattern. Each of the shutters includes a plate, and opens/closes each of the jetting ports by electronically sliding the plate in accordance with the pattern data that corresponds to the liquid crystal dripping pattern.
Inventors:
FURUSAWA, Yasuhiro (())
Application Number:
JP2010/057234
Publication Date:
February 03, 2011
Filing Date:
April 23, 2010
Export Citation:
Assignee:
SHARP KABUSHIKI KAISHA (22-22, Nagaike-cho Abeno-ku, Osaka-sh, Osaka 22, 〒5458522, JP)
シャープ株式会社 (〒22 大阪府大阪市阿倍野区長池町２２番２２号 Osaka, 〒5458522, JP)
シャープ株式会社 (〒22 大阪府大阪市阿倍野区長池町２２番２２号 Osaka, 〒5458522, JP)
International Classes:
G02F1/1341; B05C5/00; G02F1/13
Attorney, Agent or Firm:
FUKAMI, Hisao et al. (Fukami Patent Office, Nakanoshima Central Tower 22nd Floor, 2-7, Nakanoshima 2-chome, Kita-ku, Osaka-sh, Osaka 05, 〒5300005, JP)