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Title:
LIQUID DISCHARGE TREATMENT DEVICE AND LIQUID DISCHARGE TREATMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2017/154721
Kind Code:
A1
Abstract:
Provided is a liquid discharge treatment device for treating liquid discharge that is discharged from a scrubber device. The liquid discharge treatment device is provided with: a magnetic powder addition unit that adds magnetic powder to the liquid discharge; a conveyance unit that conveys the liquid discharge; and an absorption unit that is provided inside the conveyance unit, and absorbs, and holds therein, a bound substance contained in the liquid discharge, the bound substance including at least the magnetic powder and the substance targeted by the the treatment device. In one example, the absorption unit is able to release the absorbed bound substance into the conveyance unit. In another example, the absorption unit has a permanent magnet that is disposed inside the conveyance unit in a manner which allows for unmediated insertion and retraction. When inserted into the conveyance unit, the permanent magnet absorbs the bound substance, and when retracted from the conveyance unit, releases the bound substance.

Inventors:
HANAI YOSUKE (JP)
SAKAI YASUZO (JP)
Application Number:
PCT/JP2017/008252
Publication Date:
September 14, 2017
Filing Date:
March 02, 2017
Export Citation:
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Assignee:
FUJI ELECTRIC CO LTD (JP)
UNIV UTSUNOMIYA (JP)
International Classes:
C02F1/00; B03C1/00; B03C1/025; B03C1/027; B03C1/032; B03C1/035; B03C1/14; B03C1/28; C02F1/52
Domestic Patent References:
WO2015137300A12015-09-17
Foreign References:
JP2010269248A2010-12-02
JP2014018751A2014-02-03
JP2008110285A2008-05-15
JP2006341212A2006-12-21
JPH0957149A1997-03-04
Other References:
See also references of EP 3385228A4
Attorney, Agent or Firm:
RYUKA IP LAW FIRM (JP)
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