LIQUID FLOW RESISTANCE SUPPRESSING SURFACE STRUCTURE AND METHOD FOR SUPPRESSING THE LIQUID FLOW RESISTANCE OF A SUBSTRATE SURFACE

WIPO Patent Application WO/2011/010728

A1

Disclosed is a liquid flow resistance suppressing surface structure in which an ultra-hydrophilic material is arranged on a substrate surface which makes contact with a flowing liquid. Further disclosed is a method for suppressing the liquid flow resistance of a substrate surface in which the flow resistance generated between the substrate surface and the liquid which makes contact with the substrate surface is suppressed by using the liquid flow resistance suppressing surface structure. A liquid flow resistance suppressing surface structure and method for suppressing the liquid flow resistance of a substrate surface can be provided in which physical and environmental durability is ensured to an extent enabling the use thereof in industry.

SAKAI Munetoshi (2-1 Sakado 3-chome, Takatsu-ku, Kawasaki-sh, Kanagawa 12, 〒2130012, JP)
酒井宗寿 (〒12 神奈川県川崎市高津区坂戸３丁目２番１号　財団法人神奈川科学技術アカデミー内 Kanagawa, 〒2130012, JP)

JP2010/062451

January 27, 2011

July 23, 2010

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KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY (2-1 Sakado 3-chome, Takatsu-ku Kawasaki-sh, Kanagawa 12, 〒2130012, JP)
財団法人神奈川科学技術アカデミー (〒12 神奈川県川崎市高津区坂戸３丁目２番１号 Kanagawa, 〒2130012, JP)
SAKAI Munetoshi (2-1 Sakado 3-chome, Takatsu-ku, Kawasaki-sh, Kanagawa 12, 〒2130012, JP)

B32B7/02; A41D7/00; B32B1/08; B32B9/00; B32B17/00; B32B27/36; B63B1/34; C03C17/22; F16L57/00

BAN Toshimitsu (Honest International Patents, Shinko Bldg. 1-9, Nishishinjuku 8-chome, Shinjuku-k, Tokyo 23, 〒1600023, JP)

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