Title:
LIQUID-MATERIAL FEEDER AND CONTROL METHOD FOR LIQUID-MATERIAL FEEDER
Document Type and Number:
WIPO Patent Application WO/2007/036997
Kind Code:
A1
Abstract:
A liquid-material feeder with which processing conditions can be controlled
over a wide flow rate range and concentration range. The liquid-material feeder
is equipped with a container (13) to be charged with a liquid source material,
and the supply of the liquid source material is controlled by directly vaporizing
the liquid source material and transporting the vapor gas with a carrier gas.
The container is equipped with a carrier-gas introduction piping (11) through
which the carrier gas is introduced into the container, a vapor gas discharge
piping (15) through which the vapor gas transported with the carrier gas is discharged,
a liquid-source supply piping (12) through which the liquid source material
is supplied to the container, a pressure sensor (P1) for sensing the internal
pressure of the container, a heater (JH) for giving a temperature distribution
in the container, and a temperature sensor (TC) which senses the temperature
inside the container.
Inventors:
OHMI TADAHIRO (JP)
TERAMOTO AKINOBU (JP)
WAKAMATSU HIDETOSHI (JP)
TERAMOTO AKINOBU (JP)
WAKAMATSU HIDETOSHI (JP)
Application Number:
PCT/JP2005/017835
Publication Date:
April 05, 2007
Filing Date:
September 28, 2005
Export Citation:
Assignee:
OHMI TADAHIRO (JP)
TERAMOTO AKINOBU (JP)
WAKAMATSU HIDETOSHI (JP)
TERAMOTO AKINOBU (JP)
WAKAMATSU HIDETOSHI (JP)
International Classes:
C23C16/448; H01L21/31
Domestic Patent References:
| WO2004007793A2 | 2004-01-22 |
Foreign References:
| JP2003013233A | 2003-01-15 | |||
| JP2005286054A | 2005-10-13 |
Attorney, Agent or Firm:
IKEDA, Noriyasu et al. (4-10 Nishishinbashi 1-chome, Minato-k, Tokyo 03, JP)
Download PDF:
Previous Patent: SUBSTRATE HOLDING STRUCTURE
Next Patent: SEMICONDUCTOR DEVICE AND ITS FABRICATION METHOD
Next Patent: SEMICONDUCTOR DEVICE AND ITS FABRICATION METHOD