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Title:
LIQUID METAL ION GUN
Document Type and Number:
WIPO Patent Application WO/2010/137476
Kind Code:
A1
Abstract:
Disclosed is a liquid metal ion gun (3) comprising a liquid metal ion source (31) having a reservoir (36) which is formed of tungsten (W) and holds liquid metal gallium (Ga) and an emitter (35) formed of W, and a beam limiting aperture (33) for limiting the diameter of an ion beam (2), which is formed by mounting a liquid metal material (44) composed of Ga on a base (46) formed of W and has an opening (41) for permitting passage of the ion beam (2) drawn out from a liquid metal ion source (31), wherein the beam limiting aperture (33) is provided with a groove structure (45) for collecting the liquid metal (44) around the opening (41). Consequently, the life of the beam limiting aperture is extended, emission can be sustained stably for a long time, and stable state can be restored with good reproducibility.

Inventors:
KAGA Hiroyasu (Hitachi High-Technologies Corporation 882, Ohaza-Ichige, Hitachinaka-sh, Ibaraki 04, 〒3128504, JP)
加賀 広靖 (〒04 茨城県ひたちなか市大字市毛882番地 株式会社日立ハイテクノロジーズ 那珂事業所内 Ibaraki, 〒3128504, JP)
NAGAO Kanehiro (Hitachi High-Technologies Corporation 882, Ohaza-Ichige, Hitachinaka-sh, Ibaraki 04, 〒3128504, JP)
Application Number:
JP2010/058229
Publication Date:
December 02, 2010
Filing Date:
May 14, 2010
Export Citation:
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Assignee:
HITACHI HIGH-TECHNOLOGIES CORPORATION (24-14, Nishi Shimbashi 1-chome Minato-k, Tokyo 17, 〒1058717, JP)
株式会社日立ハイテクノロジーズ (〒17 東京都港区西新橋一丁目24番14号 Tokyo, 〒1058717, JP)
KAGA Hiroyasu (Hitachi High-Technologies Corporation 882, Ohaza-Ichige, Hitachinaka-sh, Ibaraki 04, 〒3128504, JP)
加賀 広靖 (〒04 茨城県ひたちなか市大字市毛882番地 株式会社日立ハイテクノロジーズ 那珂事業所内 Ibaraki, 〒3128504, JP)
International Classes:
H01J27/26; H01J37/09
Attorney, Agent or Firm:
KASUGA Yuzuru (Torii-nihonbashi Bldg, 4-1 Nihonbashi-honcho 3-chome, Chuo-k, Tokyo 23, 〒1030023, JP)
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