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Patent Searching and Data


Title:
LIQUID METAL ION SOURCE
Document Type and Number:
WIPO Patent Application WO1987003739
Kind Code:
A1
Abstract:
A liquid metal ion source which is prepared by melting a material to be ionized. The material to be ionized is an alloy represented by the compositional formula of LX?RY?MA? wherein X, Y, and A each represents an atomic %, L represents at least one element of Pt, Pd, and Ag, R represents at least one element of As, P and B, M represents at least one element of Ge, Si, and Sb, wherein 5 < A < 50, 40 < X < 70, and X + Y + A = 100. This material enables at least one element of As, P, and B to be drawn out stably for a long time.

Inventors:
UMEMURA KAORU (JP)
ISHITANI TOHRU (JP)
AIDA TOSHIYUKI (JP)
TAMURA HIFUMI (JP)
Application Number:
PCT/JP1986/000618
Publication Date:
June 18, 1987
Filing Date:
December 05, 1986
Export Citation:
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Assignee:
HITACHI LTD (JP)
International Classes:
H01J1/02; H01J27/26; H01J37/08; (IPC1-7): H01J1/02; H01J37/08
Foreign References:
JPS59191225A1984-10-30
JPH0656327A1994-03-01
Other References:
See also references of EP 0248914A4
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