Title:
LIQUID PHOTOREACTIVE COMPOSITION AND METHOD OF FABRICATING STRUCTURES
Document Type and Number:
WIPO Patent Application WO/2015/084735
Kind Code:
A3
Abstract:
A method of fabricating a structure includes disposing a liquid photoreactive composition on a substrate, exposing a portion of the liquid photoreactive composition to laser light of sufficient intensity and wavelength to cause polymerization via two-photon excitation of the two-photon sensitizer and polymerization of a portion of the liquid photoreactive composition thereby providing an exposed composition; and developing the exposed composition to provide the structure. The liquid composition includes: at least one cationically polymerizable polyepoxide; at least one compound comprising free-radically polymerizable groups; an effective amount of a two-photon photoinitiator system, wherein the weight ratio of component (a) to component (b) is from 25:75 to 75:25, inclusive. The two-photon photoinitiator system includes a two-photon sensitizer and an aromatic onium salt. The liquid photoreactive composition may contain less than about one percent by weight of organic solvent.
Inventors:
LEE TZU-CHEN (US)
DEVOE ROBERT J (US)
NELSON BRIAN K (US)
GATES BRIAN J (US)
DEVOE ROBERT J (US)
NELSON BRIAN K (US)
GATES BRIAN J (US)
Application Number:
PCT/US2014/067955
Publication Date:
August 13, 2015
Filing Date:
December 01, 2014
Export Citation:
Assignee:
3M INNOVATIVE PROPERTIES CO (US)
International Classes:
C08F2/46
Domestic Patent References:
| WO2001096409A2 | 2001-12-20 | |||
| WO2007112309A2 | 2007-10-04 |
Attorney, Agent or Firm:
WRIGHT, Bradford B. , et al. (Saint Paul, Minnesota, US)
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