Title:
LIQUID PROCESSING UNIT AND LIQUID PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2017/199475
Kind Code:
A1
Abstract:
A liquid processing unit (1) is provided with a liquid processing structure (40) having a first surface (40a) and a second surface (40b), and having a space between the first surface and the second surface in which hydrogen ions or hydroxide ions move. Furthermore, the liquid processing unit is provided with an oxygen concentration control unit (200) for mechanically controlling the concentration of oxygen supplied to the second surface. Moreover, the second surface is in contact with a hollow section (50) having a gas containing oxygen, and the oxygen concentration control unit is installed in the hollow section. A liquid processing device (100) is provided with the liquid processing unit, and a processing tank (80) for retaining the liquid processing unit and a liquid to be processed (90) therewithin.
Inventors:
KAMAI RYO
SUZUKI YUYA
YOSHIKAWA NAOKI
YAGUCHI MITSUO
SUZUKI YUYA
YOSHIKAWA NAOKI
YAGUCHI MITSUO
Application Number:
PCT/JP2017/003179
Publication Date:
November 23, 2017
Filing Date:
January 30, 2017
Export Citation:
Assignee:
PANASONIC IP MAN CO LTD (JP)
International Classes:
C02F3/34; H01M8/04; H01M8/16
Domestic Patent References:
| WO2013073284A1 | 2013-05-23 |
Foreign References:
| JP2007090232A | 2007-04-12 | |||
| JP2009093861A | 2009-04-30 | |||
| JP2010033823A | 2010-02-12 |
Attorney, Agent or Firm:
ITO Masakazu et al. (JP)
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