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Patent Searching and Data


Title:
LIQUID SUPPLY DEVICE AND LIQUID SUPPLY METHOD
Document Type and Number:
WIPO Patent Application WO/2018/186211
Kind Code:
A1
Abstract:
The present invention comprises the following: a storage tank (102) that stores a processing liquid containing a first processing liquid (sulfuric acid) and a second processing liquid (hydrogen peroxide solution); a circulation route (104) that allows the processing liquid stored in the storage tank (102) to circulate and comprises a first pipeway (104a) that allows the processing liquid to pass through horizontally; a branch route (112) that supplies the processing liquid to a processing unit (16); and a branching section (112a) that comprises an opening (1121) that allows the processing liquid to flow out from the first pipeway (104a) to the branch route (112). When the first pipeway (104a) is observed in a cross-sectional view at the branching section (112a), the opening (1121) is disposed below the peripheral edge of the first pipeway (104a).

Inventors:
TAKAMATSU YUSUKE (JP)
TAKAKI YASUHIRO (JP)
UMENO SHINICHI (JP)
FUKUI SHOGO (JP)
Application Number:
PCT/JP2018/011742
Publication Date:
October 11, 2018
Filing Date:
March 23, 2018
Export Citation:
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Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/027; B01D19/00; B01J4/00; B05C11/10; H01L21/304
Foreign References:
JP2016162963A2016-09-05
JP2013207207A2013-10-07
JP2012199295A2012-10-18
JP2012049391A2012-03-08
JPH11176782A1999-07-02
Attorney, Agent or Firm:
SAKAI INTERNATIONAL PATENT OFFICE (JP)
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