Title:
LIQUID VAPORIZATION APPARATUS
Document Type and Number:
WIPO Patent Application WO/2007/125707
Kind Code:
A1
Abstract:
[PROBLEMS] To solve the problem of mixing of mist in a liquid vapor fed to a semiconductor process
by the use of a single vaporization apparatus. [MEANS FOR SOLVING PROBLEMS] There
is provided a liquid vaporization apparatus adapted to achieve contact of a liquid
with a carrier gas to thereby attain vaporization, comprising airtight housing
(3) and, disposed therein, vaporization section (13) fitted with porous membranes
and mist separation section (14) partitioned by bulkhead (11) from the vaporization
section (13) and fitted with filter material (27,31,43), and further comprising
liquid inlet (26) for feeding of the liquid to a liquid flow channel upstream of
the porous membranes; gas inlet (23) for feeding of the carrier gas to a gas flow
channel downstream of the porous membranes; a connection passageway passing
through the bulkhead (11) on the outlet side of the gas flow channel and making
communication to the upstream side of the filter material (27,33,43), provided
to draw out the vapor resulting from vaporization by contact of the liquid having
permeated the porous membranes with the carrier gas from the gas flow channel to
the upstream side (15) of the separation section (14); and vapor outlet (29,35) for
drawing out the vapor having mist removed therefrom from the downstream side of
the filter material (27,33,43).
Inventors:
OHYASHIKI YASUSHI (JP)
HARAGUCHI SEIJI (JP)
HARAGUCHI SEIJI (JP)
Application Number:
PCT/JP2007/056325
Publication Date:
November 08, 2007
Filing Date:
March 27, 2007
Export Citation:
Assignee:
ENTEGRIS INC (US)
OHYASHIKI YASUSHI (JP)
HARAGUCHI SEIJI (JP)
OHYASHIKI YASUSHI (JP)
HARAGUCHI SEIJI (JP)
International Classes:
B01J4/00; B01J7/00; H01L21/027; H01L21/304
Foreign References:
JPH04122024A | 1992-04-22 | |||
JP2005249256A | 2005-09-15 | |||
JPH05137922A | 1993-06-01 | |||
JPH04250830A | 1992-09-07 |
Attorney, Agent or Firm:
KAWAGUCHI, Yoshio et al. (Jochi Kioizaka Bldg.7-1 Kioi-cho, Chiyoda-ku, Tokyo 94, JP)
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