Title:
LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC SYSTEM
Document Type and Number:
WIPO Patent Application WO/2018/045557
Kind Code:
A1
Abstract:
A lithographic apparatus (100) and a lithographic system, the lithographic apparatus (100) comprising: an optical switch (110) and N photonic devices (120). The optical switch (110) comprises N sub-optical switches (111, 112), and the N sub-optical switches (111, 112) correspond one by one to N photonic devices (120, 130), N being a positive integer greater than or equal to 2; states of each of the sub-optical switches (111, 112) comprise an on state and an off state, sub-optical switches (111, 112) in the on state are used for transmitting a light beam to a corresponding photonic device (120, 130), and sub-optical switches (111, 112) in the off state cannot transmit a light beam to a corresponding photonic device (120, 30); and each photonic device (120, 130) comprises beam splitting devices (121, 131) and focusing lenses (122, 132). The lithographic apparatus (100) may prepare a required pattern without changing a relative position of the lithographic apparatus (100) to a substrate, thus avoiding steps of translation and alignment, and thereby improving processing efficiency and accuracy of an interference pattern formed on the substrate.
Inventors:
LONGNOS FLORIAN (CN)
Application Number:
PCT/CN2016/098563
Publication Date:
March 15, 2018
Filing Date:
September 09, 2016
Export Citation:
Assignee:
HUAWEI TECH CO LTD (CN)
International Classes:
G03F7/213
Foreign References:
| CN102203674A | 2011-09-28 | |||
| US20090268210A1 | 2009-10-29 | |||
| CN202306140U | 2012-07-04 | |||
| CN102981380A | 2013-03-20 | |||
| CN102368138A | 2012-03-07 | |||
| CN1658072A | 2005-08-24 |
Attorney, Agent or Firm:
LONGSUN LEAD IP LTD. (CN)
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