Title:
LITHOGRAPHIC METHOD AND APPARATUS
Document Type and Number:
WIPO Patent Application WO/2019/137725
Kind Code:
A1
Abstract:
A lithographic apparatus comprising a support structure (MT) constructed to support a mask (MA) and associated pellicle (P), the mask being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam (PB), and a projection system (PS) configured to project the patterned radiation beam onto a target portion of a substrate (W), wherein a wall (33) extends between the support structure and the projection system, the wall including an opening (22) to allow the patterned radiation beam to pass from the mask and pellicle to the projection system, and wherein the wall is provided with a two dimensional array of pressure sensors (30).
Inventors:
JEUNINK ANDRE (NL)
MOEST BEARRACH (NL)
EUMMELEN ERIK (NL)
TOLSMA HOITE (NL)
MOEST BEARRACH (NL)
EUMMELEN ERIK (NL)
TOLSMA HOITE (NL)
Application Number:
PCT/EP2018/084454
Publication Date:
July 18, 2019
Filing Date:
December 12, 2018
Export Citation:
Assignee:
ASML NETHERLANDS BV (NL)
International Classes:
G03F1/62; G03F7/20
Domestic Patent References:
| WO2016169727A1 | 2016-10-27 | |||
| WO2017050508A1 | 2017-03-30 | |||
| WO2009130243A2 | 2009-10-29 |
Foreign References:
| JP2006060037A | 2006-03-02 | |||
| US20130094678A1 | 2013-04-18 | |||
| US20130128703A1 | 2013-05-23 |
Other References:
COTTE ERIC P ET AL: "Dynamic studies of hard pellicle response during exposure scanning", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART B, AVS / AIP, MELVILLE, NEW YORK, NY, US, vol. 20, no. 6, 1 November 2002 (2002-11-01), pages 2995 - 2999, XP012009673, ISSN: 1071-1023, DOI: 10.1116/1.1520573
Attorney, Agent or Firm:
KETTING, Alfred (NL)
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