Title:
LITHOGRAPHIC METHOD PRODUCTS OBTAINED AND USE OF SAID METHOD
Document Type and Number:
WIPO Patent Application WO/2005/109097
Kind Code:
A1
Abstract:
The invention relates to a lithographic method, products obtained by use of said method and use of said method, in particular, in the production of micro- or nano-metric products or objects. The method is characterised in essentially comprising the steps of deposition of a film of an organometallic solution of a substrate, containing at least one metal ion as precursor(s) for marking said substrate, local exposure, according to the required pattern, of the obtained film, by means of at least one focussed energetic beam, with an energy density sufficient to at least locally dry said film, dissolution of the non-exposed zone, the at least dried zones remaining on said substrate, optionally subjecting the obtained product to a thermal treatment and, where necessary, repetition of certain steps, with optional change to the organometallic solution, until the required final product is obtained.
Inventors:
REHSPRINGER JEAN-LUC (FR)
BEDEL LAURENT (FR)
BEDEL LAURENT (FR)
Application Number:
PCT/FR2004/000876
Publication Date:
November 17, 2005
Filing Date:
April 08, 2004
Export Citation:
Assignee:
UNIV LOUIS PASTEUR ETABLISSEME (FR)
CENTRE NAT RECH SCIENT (FR)
REHSPRINGER JEAN-LUC (FR)
BEDEL LAURENT (FR)
CENTRE NAT RECH SCIENT (FR)
REHSPRINGER JEAN-LUC (FR)
BEDEL LAURENT (FR)
International Classes:
G03F7/004; H01L21/288; H01L21/768; H05K3/10; H05K1/03; H05K3/02; (IPC1-7): G03F7/004
Domestic Patent References:
| WO2004019130A1 | 2004-03-04 |
Foreign References:
| US5824456A | 1998-10-20 |
Attorney, Agent or Firm:
Cabinet, Nuss (Strasbourg Cedex, FR)
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