Title:
LITHOGRAPHY APPARATUS AND LITHOGRAPHY SYSTEM
Document Type and Number:
WIPO Patent Application WO/2023/197551
Kind Code:
A1
Abstract:
A lithography apparatus and a lithography system. The lithography apparatus comprises: a signal generation module (110), the signal generation module (110) being configured to generate one or more mask patterns according to a layout, and generate a corresponding mask driving signal according to each of the one or more mask patterns; and a mask driving module (120), the mask driving module (120) being in communication connection with the signal generation module (110), and the mask driving module (120) being configured to control a light-transmitting state of each pixel region on a mask (200) according to one or more groups of mask driving signals, so as to form a corresponding mask pattern on the mask (200).
Inventors:
LI XIJUN (CN)
Application Number:
PCT/CN2022/126126
Publication Date:
October 19, 2023
Filing Date:
October 19, 2022
Export Citation:
Assignee:
UNIV WESTLAKE (CN)
International Classes:
G03F7/20
Foreign References:
| CN114675507A | 2022-06-28 | |||
| CN112799285A | 2021-05-14 | |||
| CN103513509A | 2014-01-15 | |||
| CN1468406A | 2004-01-14 | |||
| CN101813881A | 2010-08-25 | |||
| KR20070066809A | 2007-06-27 |
Attorney, Agent or Firm:
CCPIT PATENT AND TRADEMARK LAW OFFICE (CN)
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