Title:
LITHOGRAPHY STEPPER ALIGNMENT AND CONTROL METHOD
Document Type and Number:
WIPO Patent Application WO/2015/197023
Kind Code:
A1
Abstract:
A lithography stepper alignment and control method, comprising: providing a test template having a plurality of field sizes, and deriving a set of overlay values for each field size (S1); calculating a set of compensation amounts for the overlay values of each field size (S2); and, comparing alignment compensation values for a product with each compensation amount for each field size, selecting as the product alignment compensation values the set of compensation amounts of a field size closest to estimated alignment compensation values, and, using the product alignment compensation values to perform alignment compensation on said product (S3).
Inventors:
YAO ZHENHAI (CN)
Application Number:
PCT/CN2015/082523
Publication Date:
December 30, 2015
Filing Date:
June 26, 2015
Export Citation:
Assignee:
CSMC TECHNOLOGIES FAB2 CO LTD (CN)
International Classes:
G03F9/00; G03F7/20
Domestic Patent References:
| WO2011087129A1 | 2011-07-21 |
Foreign References:
| US20130258306A1 | 2013-10-03 | |||
| CN103105741A | 2013-05-15 | |||
| CN102955379A | 2013-03-06 | |||
| CN101435998A | 2009-05-20 | |||
| US20080057418A1 | 2008-03-06 |
Attorney, Agent or Firm:
ADVANCE CHINA IP LAW OFFICE (CN)
广州华进联合专利商标代理有限公司 (CN)
广州华进联合专利商标代理有限公司 (CN)
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