Title:
LITHOGRAPHY SYSTEM FOR PROCESSING A TARGET, SUCH AS A WAFER, A METHOD FOR OPERATING A LITHOGRAPHY SYSTEM FOR PROCESSING A TARGET, SUCH AS A WAFER AND A SUBSTRATE FOR USE IN SUCH A LITHOGRAPHY SYSTEM
Document Type and Number:
WIPO Patent Application WO/2012/144903
Kind Code:
A3
Abstract:
The invention relates to a lithography system for processing a target, such as a wafer and a substrate for use in such a lithography system. The lithography system comprises a beam source arranged for providing a patterning beam, a final projection system arranged for projecting a pattern on the target surface, a chuck arranged for supporting the target and a mark position system arranged for detecting a position mark on a surface.
Inventors:
COUWELEERS GODEFRIDUS CORNELIUS ANTONIUS (NL)
PLANDSOEN LAURENS (NL)
VERBURG COR (NL)
VERGEER NIELS (NL)
DE BOER GUIDO (NL)
PLANDSOEN LAURENS (NL)
VERBURG COR (NL)
VERGEER NIELS (NL)
DE BOER GUIDO (NL)
Application Number:
PCT/NL2012/050270
Publication Date:
July 25, 2013
Filing Date:
April 23, 2012
Export Citation:
Assignee:
MAPPER LITHOGRAPHY IP BV (NL)
COUWELEERS GODEFRIDUS CORNELIUS ANTONIUS (NL)
PLANDSOEN LAURENS (NL)
VERBURG COR (NL)
VERGEER NIELS (NL)
DE BOER GUIDO (NL)
COUWELEERS GODEFRIDUS CORNELIUS ANTONIUS (NL)
PLANDSOEN LAURENS (NL)
VERBURG COR (NL)
VERGEER NIELS (NL)
DE BOER GUIDO (NL)
International Classes:
G03F9/00
Foreign References:
| US20100245848A1 | 2010-09-30 |
Attorney, Agent or Firm:
SMIT, Marco (Dr. Kuyperstraat 6, BB Den Haag, NL)
Download PDF: