Title:
LOW IRRITATION NAIL POLISH
Document Type and Number:
WIPO Patent Application WO/2018/053881
Kind Code:
A1
Abstract:
A low irritation nail polish, comprising components in the following parts by weight: 41-75 parts of ethanol; 10-40 parts of an alcohol-soluble film-forming agent; 1-10 parts of a plasticizer; 0-20 parts of an auxiliary solvent; 0-5 parts of a pigment; 0-5 parts of an additive; and 0-3 parts of an essence. The nail polish is free of pungent odor, has low irritation, does not lead to solubility corrosion, has better water resistance, and does not return sticky after dryness, and adhesion and surface gloss thereof are similar to ester solvent-type nail polish.
Inventors:
JIN JIYUE (CN)
Application Number:
PCT/CN2016/100248
Publication Date:
March 29, 2018
Filing Date:
September 27, 2016
Export Citation:
Assignee:
JINHUA MINGSHI TECH CO LTD (CN)
International Classes:
A61K8/60; A61K8/25; A61K8/34; A61K8/37; A61Q3/02
Foreign References:
| CN102552059A | 2012-07-11 | |||
| CN104188875A | 2014-12-10 | |||
| CN104997649A | 2015-10-28 | |||
| CN105813692A | 2016-07-27 | |||
| US4820509A | 1989-04-11 | |||
| US20060216250A1 | 2006-09-28 |
Attorney, Agent or Firm:
BEIJING ZHUOTANG INTELLECTUAL PROPERTY CO., LTD. (CN)
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