LOW MOLECULAR WEIGHT COMPOUND, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN

WIPO Patent Application WO/2012/098828

A1

The purpose of the present invention is to provide: a low molecular weight compound, which has high solubility in a safe solvent and high sensitivity, and which is used as a crosslinking agent for a negative resist that is capable of providing a good resist pattern shape; and a method for forming a resist pattern, which uses the low molecular weight compound which serves as a crosslinking agent. A means for achieving the purpose is characterized by using a low molecular weight compound (B) which is represented by formula (1). (In formula (1), M independently represents a hydroxymethyl group, a methoxymethyl group or an ethoxymethyl group; Ra represents a trivalent or tetravalent hydrocarbon group having a specific structure; and n represents an integer of 3 or 4.)

HAYASHI HIROMI (JP)
ECHIGO MASATOSHI (JP)

PCT/JP2012/000062

July 26, 2012

January 06, 2012

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MITSUBISHI GAS CHEMICAL CO (JP)
HAYASHI HIROMI (JP)
ECHIGO MASATOSHI (JP)

C07C39/12; C07C39/17; C07C43/178; G03F7/004; G03F7/038; H01L21/027

WO2011040340A1

2011-04-07

JP2000035669A	2000-02-02
JPH06313029A	1994-11-08
JPH06312947A	1994-11-08
JP2003260881A	2003-09-16
JP2002225453A	2002-08-14
JP2006059694A	2006-03-02
JP2008004279A	2008-01-10
JP2008112616A	2008-05-15
JP2009295336A	2009-12-17
JP2008276982A	2008-11-13
JP2007031402A	2007-02-08
JP2008152203A	2008-07-03
JP2008162968A	2008-07-17
JP2001011001A	2001-01-16

SUGIMURA, KENJI (JP)
Kenji Sugimura (JP)

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