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Title:
LOW-MOLECULAR-WEIGHT POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD
Document Type and Number:
WIPO Patent Application WO/2011/070718
Kind Code:
A1
Abstract:
Disclosed are: a radiation-sensitive composition which enables the formation of a resist pattern having a satisfactory shape and contains a resist material (a compound) that can be produced and quality-controlled readily; and a resist pattern formation method using the radiation-sensitive composition. Specifically disclosed are: a positive-type radiation-sensitive composition comprising (A) a low-molecular-weight compound which has at least one phenolic hydroxy or carboxyl group having an acid labile functional group introduced thereinto in the molecule, is insoluble in an alkaline developing solution but can become soluble in an alkaline developing solution upon receiving the action of an acid, and has a molecular weight of 400 to 3000 and a Mw/Mn ratio ranging from 1.00 to 1.05 inclusive, (B) a low-molecular-weight compound which has at least one phenolic hydroxy or carboxyl group in the molecule, is soluble in an alkaline developing solution, and has a molecular weight of 350 to 2500 and a Mw/Mn ratio ranging from 1.00 to 1.05 inclusive, (C) an acid generating agent, (E) an acid diffusion inhibitor, and a solvent; and a resist pattern formation method using the composition.

Inventors:
ECHIGO MASATOSHI (JP)
Application Number:
PCT/JP2010/006573
Publication Date:
June 16, 2011
Filing Date:
November 09, 2010
Export Citation:
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Assignee:
MITSUBISHI GAS CHEMICAL CO (JP)
ECHIGO MASATOSHI (JP)
International Classes:
G03F7/039; G03F7/004; H01L21/027; C07C39/12; C07C39/17; C07C43/20; C07C43/21; C09K3/00
Foreign References:
JP2009173623A2009-08-06
JP2005346024A2005-12-15
JP2009244804A2009-10-22
JP2009221195A2009-10-01
JP2009221194A2009-10-01
JP2008133266A2008-06-12
JP2008033102A2008-02-14
JP2006323011A2006-11-30
JP2006241146A2006-09-14
JP2006169137A2006-06-29
JP2006169136A2006-06-29
JP2010159253A2010-07-22
Attorney, Agent or Firm:
SUGIMURA, KENJI (JP)
Kenji Sugimura (JP)
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