Title:
LOW REFRACTIVE INDEX FILM AND PRODUCTION METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2015/141718
Kind Code:
A1
Abstract:
The present invention is a low refractive index film that is obtained by applying a composition that contains an aggregate of aggregated fumed silica particles and a hydrolysate of silicon alkoxide on a substrate or on a layer that is formed on the substrate and firing the result. The porosity of the low refractive index film is in the range of 15-55%, the refractive index directly after film formation is in the range of 1.15-1.39, and the rate of change of the refractive index is 8% or less.
Inventors:
HIGANO SATOKO (JP)
YAMASAKI KAZUHIKO (JP)
YAMASAKI KAZUHIKO (JP)
Application Number:
PCT/JP2015/058043
Publication Date:
September 24, 2015
Filing Date:
March 18, 2015
Export Citation:
Assignee:
MITSUBISHI MATERIALS CORP (JP)
International Classes:
G02B1/111; B32B9/00; C09D7/12; C09D183/04; C09D183/08
Domestic Patent References:
| WO2012147876A1 | 2012-11-01 | |||
| WO2013001975A1 | 2013-01-03 |
Foreign References:
| JP2006220906A | 2006-08-24 | |||
| JP2002365403A | 2002-12-18 | |||
| JP2010042624A | 2010-02-25 | |||
| JP2007286554A | 2007-11-01 | |||
| JP2010115818A | 2010-05-27 | |||
| JP2014201598A | 2014-10-27 |
Attorney, Agent or Firm:
SHIGA Masatake et al. (JP)
Masatake Shiga (JP)
Masatake Shiga (JP)
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