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Title:
LOW WATER-ABSORPTIVE POLYIMIDE RESIN AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2006/068096
Kind Code:
A1
Abstract:
Disclosed is a polyimide resin obtained by reacting a compound selected from 1,2,4,5-cyclohexanetetracarboxylic acid, acid dianhydrides thereof and reactive derivatives of them with a compound selected from diamines containing at least one phenylene group and an isopropylidene group and diisocyanates. Such a polyimide resin is colorless and has high heat resistance, high transparency and low water absorption.

Inventors:
Makinoshima, Takashi c/o Mitsubishi Gas Chemical Company (Inc. Hiratsuka Research Laboratory, 6-2, Higashiyawata 5-chom, Hiratsuka-shi Kanagawa 16, 25400, JP)
Kihara, Shuta c/o Mitsubishi Gas Chemical Company (Inc. Hiratsuka Research Laboratory, 6-2, Higashiyawata 5-chom, Hiratsuka-shi Kanagawa 16, 25400, JP)
Application Number:
PCT/JP2005/023281
Publication Date:
June 29, 2006
Filing Date:
December 19, 2005
Export Citation:
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Assignee:
MITSUBISHI GAS CHEMICAL COMPANY, INC. (5-2 Marunouchi 2-chome, Chiyoda-ku, Tokyo 24, 10083, JP)
Makinoshima, Takashi c/o Mitsubishi Gas Chemical Company (Inc. Hiratsuka Research Laboratory, 6-2, Higashiyawata 5-chom, Hiratsuka-shi Kanagawa 16, 25400, JP)
Kihara, Shuta c/o Mitsubishi Gas Chemical Company (Inc. Hiratsuka Research Laboratory, 6-2, Higashiyawata 5-chom, Hiratsuka-shi Kanagawa 16, 25400, JP)
International Classes:
C08G73/10; B29C41/12; C08G18/34; C08G18/76
Attorney, Agent or Firm:
Ohtani, Tamotsu (OHTANI PATENT OFFICE, Bridgestone Toranomon Bldg. 6F. 25-2, Toranomon 3-chom, Minato-ku Tokyo 01, 10500, JP)
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