Title:
LOW WORK FUNCTION SURFACE LAYERS PRODUCED BY LASER ABLATION USING SHORT-WAVELENGTH PHOTONS
Document Type and Number:
WIPO Patent Application WO1999059759
Kind Code:
A3
Abstract:
Short-wavelength photons are used to ablate material from a low work function target (14) onto a suitable substrate (20). The short-wavelength photons are at or below visible wavelength. The elemental composition of the deposit is controlled by the composition of the target (14) and the gaseous environment in which the ablation process is performed. The process is carried out in a deposition chamber (10) to which a short-wavelength laser (12) is mounted and which includes a substrate holder (21) which can be rotated, tilted, heated, or cooled. The target material (14) is mounted onto a holder (15) that spins the target during laser ablation. In addition, the deposition chamber is provided with a vacuum pump (16), an external gas supply (17) with atomizer and radical generator (26), a gas generator for producing a flow of molecules on the substrate (20), and a substrate cleaning device, such as an ion gun (24). The substrate (20) can be rotated and tilted, for example, whereby only the tip of an emitter can be coated with a low work function material.
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Inventors:
BALOOCH MEHDI
DINH LONG N
SIEKHAUS WIGBERT J
DINH LONG N
SIEKHAUS WIGBERT J
Application Number:
PCT/US1999/010761
Publication Date:
January 13, 2000
Filing Date:
May 14, 1999
Export Citation:
Assignee:
UNIV CALIFORNIA (US)
International Classes:
C23C14/00; C23C14/02; C23C14/28; (IPC1-7): B23K26/00; H01J9/02; C23C14/28
Domestic Patent References:
| WO1994025976A1 | 1994-11-10 | |||
| WO1992006798A1 | 1992-04-30 |
Foreign References:
| US5600200A | 1997-02-04 | |||
| US4987007A | 1991-01-22 | |||
| EP0770700A1 | 1997-05-02 | |||
| EP0461050A1 | 1991-12-11 | |||
| FR2755151A1 | 1998-04-30 | |||
| GB2305440A | 1997-04-09 | |||
| EP0559156A1 | 1993-09-08 |
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