LOWER ELECTRODE ASSEMBLY AND PROCESS CHAMBER - BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD

Title:

LOWER ELECTRODE ASSEMBLY AND PROCESS CHAMBER

Document Type and Number:

WIPO Patent Application WO/2019/042179

Kind Code:

A1

Abstract:

The present invention provides a lower electrode assembly and a process chamber. The lower electrode assembly comprises a base and an insulation ring disposed between the base and a chamber bottom wall. The insulation ring can form an equivalent capacitance between the base and the chamber bottom wall, and the equivalent capacitance is formed by parallel plate capacitors that are formed by filling at least two different mediums and that are connected in parallel. By means of the lower electrode assembly provided in the present invention, the grounding capacitance of the lower electrode assembly can be adjusted, so that the consistency of process devices of the same type satisfies requirements.

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Inventors:

ZHAO JINRONG (CN)
JIAN SHIJIE (CN)

Application Number:

PCT/CN2018/101340

Publication Date:

March 07, 2019

Filing Date:

August 20, 2018

Export Citation:

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Assignee:

BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD (CN)

International Classes:

H01J37/32

Foreign References:

CN107610999A	2018-01-19
CN207542191U	2018-06-26
CN203895409U	2014-10-22
CN102867727A	2013-01-09
US6878249B2	2005-04-12

Attorney, Agent or Firm:

TEE&HOWE INTELLECTUAL PROPERTY ATTORNEYS (CN)

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