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Patent Searching and Data


Title:
LOWER ELECTRODE AND DRY ETCHING MACHINE
Document Type and Number:
WIPO Patent Application WO/2019/205339
Kind Code:
A1
Abstract:
Provided in the present invention are a lower electrode and a dry etching machine, comprising a base layer, a loading layer, and a bolt, the lower electrode comprising a sealing member, and the sealing member comprising a sealing member body and a through-hole; the loading layer comprises a connecting hole and a first counter bore; the bolt passes sequentially through the through-hole and the connecting hole, and has a threaded connection to the base layer; and the sealing member body and a bolt nut are arranged in the first counter bore. By means of the sealing member entirely covering the opening of the connecting hole, the present invention prevents damage to the electrode caused by plasma entering the connecting hole.

Inventors:
JI, Liming (Building C5, Biolake of Optics Valley,No.666 Gaoxin Avenue,East Lake High-tech Development Zone,Wuhan, Hubei 9, 430079, CN)
Application Number:
CN2018/098931
Publication Date:
October 31, 2019
Filing Date:
August 06, 2018
Export Citation:
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Assignee:
WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD. (Building C5, Biolake of Optics ValleyNo. 666 Gaoxin Avenue,East Lake High-Tech Development Zon, Wuhan Hubei 9, 430079, CN)
International Classes:
H01J37/32
Foreign References:
CN105225989A2016-01-06
CN104851832A2015-08-19
CN1246724A2000-03-08
CN107393803A2017-11-24
EP3200218A12017-08-02
Attorney, Agent or Firm:
ESSEN PATENT&TRADEMARK AGENCY (Room 1709-1711, Block AHailrun Complex,NO.6021 Shennan Blvd,Futian Distric, ShenZhen Guangdong 0, 518040, CN)
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