Title:
LPP EUV LIGHT SOURCE AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2011/027717
Kind Code:
A1
Abstract:
Disclosed is a LPP EUV light source comprised of a vacuum chamber (12) in which a vacuum environment is maintained, a gas jet device (14) which forms a hypersonic steady gas jet (1), which comprises a target substance, within the vacuum chamber in a manner such that the gas jet is recoverable, and a laser device (16) which collects a laser light (3) and irradiates the hypersonic steady gas jet with the laser light, wherein the target substance is excited at a focus (2) of the laser light to generate plasma, and extreme ultraviolet light (4) is emitted from the focus.
Inventors:
KUWABARA HAJIME (JP)
HORIOKA KAZUHIKO (JP)
HORIOKA KAZUHIKO (JP)
Application Number:
PCT/JP2010/064557
Publication Date:
March 10, 2011
Filing Date:
August 27, 2010
Export Citation:
Assignee:
IHI CORP (JP)
TOKYO INST TECH (JP)
KUWABARA HAJIME (JP)
HORIOKA KAZUHIKO (JP)
TOKYO INST TECH (JP)
KUWABARA HAJIME (JP)
HORIOKA KAZUHIKO (JP)
International Classes:
H05G2/00
Foreign References:
| JP2002544675A | 2002-12-24 | |||
| JP2001511311A | 2001-08-07 | |||
| JP2008300351A | 2008-12-11 | |||
| JP2006294606A | 2006-10-26 | |||
| JP2005032510A | 2005-02-03 | |||
| JP2007317598A | 2007-12-06 | |||
| JP2000509190A | 2000-07-18 | |||
| JP2007207574A | 2007-08-16 |
Other References:
See also references of EP 2475228A4
Attorney, Agent or Firm:
HOTTA MINORU (JP)
Minoru Hotta (JP)
Minoru Hotta (JP)
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