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Title:
METHOD FOR PRODUCING InP QUANTUM DOTS
Document Type and Number:
WIPO Patent Application WO/2019/188679
Kind Code:
A1
Abstract:
A method for producing InP quantum dots from a phosphorus source and an indium source, wherein a silylphosphine compound represented by general formula (1) is used as the phosphorus source, said silylphosphine compound having a content of a compound represented by general formula (2) of 0.3% by mole or less. It is preferable that a silylphosphine compound represented by general formula (1), which has a content of a compound represented by general formula (3) of 0.1% by mole or less, is used as the phosphorus source. (In general formula (1), each R independently represents an alkyl group having 1-5 carbon atoms (inclusive) or an aryl group having 6-10 carbon atoms (inclusive).) (In general formula (2), R is as defined in general formula (1).) (In general formula (3), R is as defined in general formula (1).)

Inventors:
NAKATSUI, Kazuhiro (9-11-1, Kameido, Koto-k, Tokyo 15, 〒1368515, JP)
TAKUBO, Yosuke (9-11-1, Kameido, Koto-k, Tokyo 15, 〒1368515, JP)
TAMURA, Ken (9-11-1, Kameido, Koto-k, Tokyo 15, 〒1368515, JP)
Application Number:
JP2019/011759
Publication Date:
October 03, 2019
Filing Date:
March 20, 2019
Export Citation:
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Assignee:
NIPPON CHEMICAL INDUSTRIAL CO., LTD. (9-11-1, Kameido Koto-k, Tokyo 15, 〒1368515, JP)
International Classes:
C01B25/08; B82Y20/00; B82Y40/00; C09K11/08; C09K11/70
Domestic Patent References:
WO2018061869A12018-04-05
Foreign References:
JP2012532953A2012-12-20
US20180047928A12018-02-15
US20150166341A12015-06-18
Attorney, Agent or Firm:
SHOWA INTERNATIONAL PATENT FIRM (NIKKEN AKASAKA BLDG, 7F. 5-7, Akasaka 2-chome, Minato-k, Tokyo 52, 〒1070052, JP)
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